OptiLayer 15 is a major version of OptiLayer Thin Film Software, a powerful tool for the design, optimization, evaluation, and post-production characterization of optical multilayer coatings. Developed by OptiLayer GmbH since 1993, it excels in solving complex thin-film problems across spectral and angular ranges, supporting materials like dielectrics, metals, ITO, and mixtures. Version 15 was released on October 8, 2021, with the latest hot-fix update (15.12g) on September 17, 2022. This version emphasizes robust manufacturing optimization, color analysis, and integration with monitoring techniques to boost yields and reduce errors in production.
OptiLayer 15 is modular, with core components for design and analysis, and it’s user-friendly for beginners while powerful for experts in optics, photonics, and laser applications. It’s widely used for antireflection coatings, high reflectors, dispersive mirrors, filters, beamsplitters, and more.
Key Features of OptiLayer 15
OptiLayer 15 introduces advanced algorithms for automatic synthesis of feasible designs tailored to real-world deposition processes and monitoring. Below is a summary of core modules and enhancements:
| Module/Feature | Description | Key Benefits |
|---|---|---|
| Design Module | Automatic synthesis and gradual evolution techniques for multilayers, including rugate filters and chirped mirrors. Supports insertion of new layers near substrate or ambient. | Generates production-ready designs quickly; handles special classes like omnidirectional AR or WDM filters with high spectral accuracy. |
| Characterization Module | Post-production analysis of experimental data, including substrate back-side effects in reflectance/transmittance measurements. | Improves yield by identifying errors early; accounts for real measurement conditions for precise inverse problems. |
| Optimization Tools | Robust optimization for manufacturing, with history tracking to avoid losing in-process designs. Includes color targets in CIE XYZ, CRI, and DE2000. | Ensures designs are stable against variations; optimizes for integral transmittance (>50% in visible range) alongside color coordinates. |
| Monitoring & Pre-Production | Error analysis, computational manufacturing, and compatibility with deposition processes like ion-assisted e-beam. | Reduces physical tryouts; integrates with hardware for real-time monitoring. |
| New in 15.12 | Enhanced algorithms for color coatings (e.g., orange/violet reflectors) and sandwich starting designs with fixed thicknesses. | Simplifies complex color dichroics; freezes structures during evolution for stability. |
