Crosslight CSUPREM 2024: Advanced Semiconductor Process Simulation Suite

Virtually fabricate and optimize semiconductor devices with Crosslight CSUPREM 2024, a powerful TCAD software dedicated to simulating complex semiconductor manufacturing processes. This industry-respected tool allows engineers and researchers to model crucial fabrication steps like ion implantation, diffusion, and oxidation in 1D and 2D, providing deep insight into dopant profiles and layer formation. Download Crosslight CSUPREM 2024 to accelerate process development, reduce R&D costs, and achieve first-pass success in silicon.

 Core Features of Crosslight CSUPREM 2024

CSUPREM 2024 provides a specialized environment for simulating the physical and chemical transformations that occur during semiconductor wafer processing.

  • Comprehensive Process Step Simulation
    Model the entire front-end fabrication sequence. Accurately simulate key processes including ion implantation, dopant diffusion (for Arsenic, Boron, Phosphorus), thermal oxidation, epitaxy, deposition, and etching to predict the final structure of your semiconductor device.

  • Advanced 1D and 2D Modeling Capabilities
    Analyze dopant distribution and junction depths with high precision. The software provides robust 1D simulations for quick analysis and powerful 2D simulations to model complex geometries, isolation structures, and edge effects that are critical in modern devices.

  • Calibrated Physical Models
    Achieve results that correlate closely with real-world fabrication. CSUPREM 2024 includes a wide range of calibrated and advanced physical models for diffusion, segregation, and point defect kinetics, ensuring high accuracy in predicting dopant behavior.

  • Seamless Integration with Device Simulation
    Create a complete TCAD workflow. The output from CSUPREM 2024 can be directly fed into Crosslight’s device simulators (like LASTIP and APSYS) to analyze the electrical characteristics of the fabricated structure, bridging the gap between process and device performance.

  • Advanced Visualization and Analysis Tools
    Gain deep insight into your simulation results. Visualize doping concentrations, net active profiles, and layer structures with detailed 1D and 2D plotting tools to analyze and optimize your process recipe.