Mentor Calibre is an industry-standard platform for IC physical verification, circuit verification, and DFM optimization. It includes tools like Calibre nmDRC (Design Rule Checking), nmLVS (Layout vs. Schematic), xACT (parasitic extraction), PERC (reliability verification), and DFM tools for yield enhancement and multi-patterning. It is widely used by foundries, integrated device manufacturers (IDMs), and fabless companies for ensuring designs meet manufacturing requirements across all process nodes.
Calibre in 2025: Key Information
- Calibre OS Roadmap for 2025:
- Supported Operating Systems: Calibre in 2025 supports Linux-based systems, including Red Hat Enterprise Linux (RHEL) 8 and 9, Alma Linux, Rocky Linux, and SUSE Linux Enterprise Server (SLES). Support for RHEL 7 and SLES 12 SP5 is limited, with the 2025.2 release (June 2025) being the last to support these older versions, requiring a special setting to enable execution.
- Discontinuation Notices: Support for RHEL 6 and SLES 11 ended with the 2024.2 release, and only limited support is provided for 2023–2024 versions on these systems. RHEL 7 and SLES 12 will follow suit after 2025.2.
- Hardware Requirements: Calibre requires 64-bit x86 hardware with AVX2 CPU instruction set support. It is compatible with AMD and Intel processors but does not support Linux IBM Power or ARM distributions.
- Calibre 2024.2 Release:
- The latest mentioned release, Calibre 2024.2_36.24 (Linux, 24.2 GB), includes updates to the Calibre nmPlatform for physical verification and DFM optimization. This version is likely relevant for 2025 workflows, as it supports advanced nodes and integrates with major design tools.
- Features include enhanced nmDRC Recon for early-stage verification, Pattern Matching, Multi-Patterning, and Auto-Waivers to reduce false violations and speed up debugging.
- AI/ML Enhancements:
- Calibre has integrated AI and machine learning (ML) to improve performance. The Calibre mlOPC (Machine Learning Optical Proximity Correction) offers 3x faster runtimes with nanometer-level accuracy, reducing OPC runtime by up to 75%. Additionally, LFD with Machine Learning improves lithography simulation by 10–20x for high-risk patterns, enhancing full-chip analysis efficiency.
- Cloud Readiness:
- The Calibre nmPlatform is cloud-ready, offering scalable, high-performance hardware access with robust security for proprietary IP. This enables faster turnaround times for large designs.
- 3D IC and Advanced Node Support:
- Calibre supports 3D IC design from early floor planning to final sign-off, addressing complex multi-chiplet designs. It also handles advanced nodes with tools for multi-patterning, voltage-dependent spacing rules, and advanced fill solutions.
